ulsi

  • 网络超大规模集成电路;特大规模集成电路(Ultra Large Scale IC);甚大规模集成电路(upper large scale integration)

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超大规模集成电路

由于超大规模集成电路ULSI)向高度集成和多层布线结构发展,化学机械抛光/平坦化已成为集成电路不可缺少的关键工艺。 …

特大规模集成电路(Ultra Large Scale IC)

...这句话是对IC产品从小规模集成电路(SSI)到今天特大规模集成电路ULSI)发展过程的最好总结,即整个集成电路产品的 …

甚大规模集成电路(upper large scale integration)

甚大规模集成,ULSI,在线英语词典,英文翻译,专... ... ) ULSI 甚大规模集成 ) ULSI 甚大规模集成电路 ) Very large Array 甚大阵 ...

大规模集成电路(ultra large scale integrated)

... technologies, which are ultra large scale integrated (ULSI) circuits and thin film transistor (TFT) arrays.

1
A copper line having self assembled monolayer for use in ULSI semiconductor devices and methods of making the same are presented. 本发明提供用于ULSI半导体器件的具有自组装单分子层的铜线及其制造方法。
2
Metal silicide films are extensively used as contact meterials in Ultra-large Scale Integrated Circuits (ULSI). 金属硅化物薄膜是广泛应用于超大规模集成电路器件的重要电子材料。
3
The no-blemish copper deposition in micro trench is the essential problem needing to be resolved in the development of ULSI manufacture. 微细凹槽内无空洞和缝隙缺陷镀铜是集成电路芯片铜布线制造工艺技术发展中需解决的一个关键问题。
4
In this thesis, we focuse on the microstructure and stress of ULSI Cu interconnects with their impacts on MTF of the electromigration. 本论文主要研究了ULSI中铜互连线的微观结构和应力及其对与电徙动MTF的影响。
5
Study on Controlling the Concentrations of Dissolved Oxygen and Total Organic Carbon in Water Used for ULSI 控制超大规模集成电路用水中的溶解氧和总有机碳浓度的研究
6
An Energy Transfer Photochemical Model for the Abatement of Total Organic Carbon in High Purity Water Used in ULSI Fabrication 降低超大规模集成电路用高纯水中总有机碳的能量传递光化学模型
7
Study and Optimization of CMP Slurry Used to Tantalum Barrier Layer of Copper Interconnection in ULSI ULSI铜多层布线中钽阻挡层CMP抛光液的研究与优化
8
Extremely Ultraviolet Lithography Fabrication Technology for Nanometer ULSI Devices 制备纳米级ULSI的极紫外光刻技术
9
State of the arts Cu interconnect and its reliability in ULSI ULSI中铜互连及其可靠性的研究与进展
10
Influence of Interconnection Configuration on Thermal Dissipation of ULSI Interconnect Systems 超大规模集成电路互连系统的布线构造对散热的影响
11
Theoretical Calculation on the Mechanical Characterization of ULSI Two-Layer Interconnect Films by Surface Acoustic Waves 表面波表征ULSI互连布线双层薄膜机械特性的理论计算
12
Corrosive Wear Analysis of the Copper Chemical-mechanical Polishing in ULSI Manufacturing ULSI制造中铜化学机械抛光的腐蚀磨损机理分析
13
A Novel Analytical Thermal Model for Temperature Estimation of Multilevel ULSI Interconnects 一种新型的集成电路金属连线温度分析解析模型
14
State-of-the-Art of the On-Chip Copper Interconnect Technology for ULSI's 集成电路片内铜互连技术的发展
15
Research and Prospects on Copper Chemical Mechanical Polishing in ULSI Manufacturing ULSI制备中铜布线化学机械抛光技术的研究与展望
16
Chemical Mechanical Polishing of Silica Dielectric in ULSI Manufacturing 介质的化学机械抛光
17
RBR control applied on chemical -mechanical polishing process in ULSI manufacturing RBR控制在超大规模集成电路制造的化学机械抛光工艺中的应用
18
Technology analysis of wafer chemical mechanical polishing in the manufacture of ULSI 超大规模集成电路制造中硅片化学机械抛光技术分析
19
Encapsulation of Copper Interconnects in ULSI Using Cobalt Alloys through Electroless Deposition 通过化学镀用钴合金密封ULSI中的铜互连
20
Analysis and Research of Cleaning Technology for ULSI Silicon Substrate Wafer ULSI硅衬底片清洗技术的分析研究
21
Key Technologies for Copper Interconnections in ULSI ULSI中铜互连线技术的关键工艺
22
The Engineering Maintenance of ULSI Design Software 超大规模集成电路设计软件的工程化维护
23
Chemomechanical polishing technique of silicon substrate in ULSI ULSI硅衬底的化学机械抛光技术
24
Development and Challenges of Lithography for ULSI 硅集成电路光刻技术的发展与挑战
25
Study on fluorinated diamond-like carbon films for ULSI ULSI用氟化类金刚石薄膜的研究
26
Study on Polishing Slurry for Silicon Substrate in ULSI 超大规模集成电路制备中硅衬底抛光液研究
27
Development of Diffusion Barrier for Cu Interconnection in ULSI 集成电路Cu互连扩散阻挡层的研究进展
28
Analysis of Hot Spots in ULSI Interconnect and Via Systems ULSI中金属互连系统上的热点分析
29
Diffusion Barrier of Cu Metallization in ULSI 集成电路Cu金属化中的扩散阻挡层
30
ULSI Ultra Large Scale Integration 超大规模集成